Type
Text
Type
Dissertation
Advisor
Dominik Schneble | Metcalf, Harold | Derek Teaney | Jon Longtin.
Date
2010-08-01
Keywords
Atom, Helium, Lithography, Metastable, Neutral | Physics, Atomic
Department
Department of Physics
Language
en_US
Source
This work is sponsored by the Stony Brook University Graduate School in compliance with the requirements for completion of degree.
Identifier
http://hdl.handle.net/11401/72649
Publisher
The Graduate School, Stony Brook University: Stony Brook, NY.
Format
application/pdf
Abstract
Resist based neutral atom lithography with metastable 23S1 helium(He. ) has been used to produce small structures in both goldand palladium. A beam of He. from a reverse flow, DC dischargesource is collimated by the bichromatic optical force followed bythree optical molasses velocity compression stages. The He. beamthen crosses a region where a mechanical or optical mask createsthe desired pattern.In the first experiments, a self assembled monolayer (SAM) ofnonanethiol is grown on a gold coated silicon wafer and then exposedto the bright, collimated beam of He. after a Nickel micromesh mask. The mesh protects parts of the SAM from the 20 eVof internal energy deposited by the impact of a He. atom onto thesample surface. The pattern of the mesh is transferred into the~200 Å gold layer with a standard selective etch that removes theGold from under the damaged SAM molecules. The samples wereanalyzed with an Atomic Force Microscope and Scanning ElectronMicroscope.The second set of experiments were performed using an opticalmask to pattern a gold coated silicon wafer. In the optical mask,the He. atoms experience the dipole force while traversing a standinglight wave of &lambda1<\sub> = 1083 nm light tuned 490 MHz above the 23S1<\sub>→ 23P2 transition or, in separate experiments, &lambda2<\sub> = 389 nmlight tuned 80 MHz below the 23S1<\sub>→ 33P2 transition. Using theoptical masks, He. can be focused or channeled into parallel linesseparated by &lambda/2 by varying the intensity of the standing lightwave.The small structures created by the 389 nm optical mask beganapproaching the gold surface granularity. A ~200 Å layer of palladium on silicon was chosen as the palladium granularity is muchsmaller and the SAM of nonanethiol will still form on the surface.Experiments using a nickel micro mesh as a mechanical mask havedemonstrated similar features to those in gold.
Recommended Citation
Reeves, Jason R., "Neutral Atom Lithography Using the 389 nm Transition in Metastable Helium" (2010). Stony Brook Theses and Dissertations Collection, 2006-2020 (closed to submissions). 1852.
https://commons.library.stonybrook.edu/stony-brook-theses-and-dissertations-collection/1852